Citation: | CHEN Guomei, DU Chunkuan, NI Zifeng, BIAN Da, WANG Hao, ZHANG Ping, ZHANG Xin. Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel[J]. Diamond & Abrasives Engineering, 2022, 42(6): 753-759. doi: 10.13394/j.cnki.jgszz.2022.0047 |
[1] |
马双义. 柔性不锈钢衬底CIGS电池阻挡层及界面钝化的研究[D]. 保定: 河北大学, 2021.
MA Shuangyi. Study on barrier layer and interface passivation of CIGS cells on flexible stainless steel substrate [D]. Baoding: Hebei University, 2021.
|
[2] |
WENG J, LIN R, RONG X. Study on polishing slurry of hydrogen peroxide-oxalic acid in CMP 304 stainless steel [J]. MATEC Web of Conferences,2020,327(1):02002. doi: 10.1051/matecconf/202032702002
|
[3] |
王浩, 陈国美, 倪自丰, 等. 1, 2, 4-三氮唑和苯并三氮唑对316L不锈钢化学机械抛光的影响 [J]. 金刚石与磨料磨具工程,2021,41(1):83-88. doi: 10.13394/j.cnki.jgszz.2021.1.0014
WANG Hao, CHEN Guomei, NI Zifeng, et al. Effect of 1, 2, 4-triazole and benzotriazole on chemical-mechanical polishing of 316L stainless steel [J]. Diamond & Abrasives Engineering,2021,41(1):83-88. doi: 10.13394/j.cnki.jgszz.2021.1.0014
|
[4] |
HU X, SONG Z, LIU W, et al. Chemical mechanical polishing of stainless steel foil as flexible substrate [J]. Applied Surface Science,2012,258(15):5798-5802. doi: 10.1016/j.apsusc.2012.02.100
|
[5] |
NI Z, ZHANG P, CHEN G, et al. An innovative movement mode of friction and wear tester worktable and its application in CMP [J]. Ecs Journal of Solid State Science and Technology,2021,10(10):103010. doi: 10.1149/2162-8777/ac2b3a
|
[6] |
LEE D, LEE H, JEONG H. Slurry components in metal chemical mechanical planarization (CMP) process: A review [J]. International Journal of Precision Engineering and Manufacturing,2016,17(12):1751-1762. doi: 10.1007/s12541-016-0201-y
|
[7] |
LEE D, KIM H, PAK B, et al. Electrochemical analysis of the slurry composition for chemical mechanical polishing of flexible stainless-steel substrates [J]. Journal of Friction and Wear,2017,38(6):482-489. doi: 10.3103/S1068366617060083
|
[8] |
JIANG L, HE Y, LUO J. Chemical mechanical polishing of steel substrate using colloidal silica-based slurries [J]. Applied Surface Science,2015,330:487-495. doi: 10.1016/j.apsusc.2015.01.016
|
[9] |
王玉松, 江亮, 钱林茂. 过氧化氢对轴承钢化学机械抛光性能的影响 [J]. 轻工机械,2019,37(5):1-5. doi: 10.3969/j.issn.1005-2895.2019.05.001
WANG Yusong, JIANG Liang, QIAN Linmao. Effect of hydrogen peroxide on chemical mechanical polishing performance of bearing steel [J]. Light Industry Machinery,2019,37(5):1-5. doi: 10.3969/j.issn.1005-2895.2019.05.001
|
[10] |
马莹, 何静, 马荣骏. 三价铁离子在酸性水溶液中的行为 [J]. 湖南有色金属,2005(1):36-39. doi: 10.3969/j.issn.1003-5540.2005.01.013
MA Ying, HE Jing, MA Rongjun. Fe (Ⅲ) behaviores in acidic solutions [J]. Hunan Nonferrous Metals,2005(1):36-39. doi: 10.3969/j.issn.1003-5540.2005.01.013
|
[11] |
AKSU S, DOYLE F M. Electrochemistry of copper in aqueous glycine solutions [J]. Journal of the Electrochemical Society,2001,148(1):B51-B57. doi: 10.1149/1.1344532
|
[12] |
俞露, 崔艳丽, 管海跃, 等. 一水合甘氨酸亚铁螯合物的合成及其表征 [J]. 浙江大学学报(理学版),2013,40(3):291-296.
YU Lu, CUI Yanli, GUAN Haiyue, et al. Synthesis and characterization of ferrous glycinate monohydrate [J]. Journal of Zhejiang University (Science Edition),2013,40(3):291-296.
|
[13] |
GORANTLA V R K, GOIA D, MATIJEVIC E, et al. Role of amine and carboxyl functional groups of complexing agents in slurries for chemical mechanical polishing of copper [J]. Journal of the Electrochemical Society,2005,152(12):912-916. doi: 10.1149/1.2083287
|
[14] |
黄乃宝, 梁成浩, 郭华. 抛光液对304钢在模拟PEMFC阳极环境中电化学行为的影响 [J]. 腐蚀科学与防护技术,2009,21(2):218-220. doi: 10.3969/j.issn.1002-6495.2009.02.047
HUANG Naibao, LIANG Chenghao, GUO Hua. Influence of polishing solution on electrochemical behavior of 304SS in a simulated PEMFC anode environment [J]. Corrosion Science and Protection Technology,2009,21(2):218-220. doi: 10.3969/j.issn.1002-6495.2009.02.047
|
[15] |
GORANTLA V R K, BABEL A, PANDIJA S, et al. Oxalic acid as a complexing agent in CMP slurries for copper [J]. Electrochemical and Solid-State Letters,2005,8(5):G131-G134. doi: 10.1149/1.1883873
|
[16] |
宋国强, 檀柏梅, 刘玉岭, 等. AEO表面活性剂EO加成数对铜互连阻挡层抛光液的影响 [J]. 应用化工,2021,50(9):2362-2366. doi: 10.3969/j.issn.1671-3206.2021.09.007
SONG Guoqiang, TAN Baimei, LIU Yuling, et al. Effect of EO addition number of AEO surfactant on polishing slurry for barrier layer of copper interconnect [J]. Applied Chemical Industry,2021,50(9):2362-2366. doi: 10.3969/j.issn.1671-3206.2021.09.007
|
[17] |
黄力, 刘洋, 纵宇浩, 等. 烟气中 Fe2O3对商用V-Mo/Ti 脱硝催化剂的性能影响研究 [J]. 化学试剂,2021,43(11):1486-1491.
HUANG Li, LIU Yang, ZONG Yuhao, et al. Investigation of Fe2O3 in flue gas on the catalytic performance of commercial V-Mo/Ti De-NOx catalyst [J]. Chemical Reagents,2021,43(11):1486-1491.
|
[18] |
邬倩倩, 黄满红, 宋佳玲, 等. Fe0/H2O2对正渗透处理印染废水的性能影响及机理研究 [J]. 膜科学与技术,2021,41(5):105-113.
WU Qianqian, HUANG Manhong, SONG Jialing, et al. Effect of Fe0/H2O2 on the performance and mechanism of forward osmosis treatment of practical printing and dyeing wastewater [J]. Membrane Science and Technology,2021,41(5):105-113.
|