摘要:
Recently, with the rapid development of chemical vapor deposition (CVD) technology, large area free-standing CVD diamond films have been produced successfully. However, the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement. The current study evaluates several existing polishing methods for CVD diamond films, including mechanical polishing, chemical mechanical polishing and tribochemical polishing technology.