用于金刚石摩擦化学抛光的Ni-W合金盘制备

牛昊; 金洙吉; 沈煜; 杨辉鹏

doi:10.13394/j.cnki.jgszz.2023.0042

用于金刚石摩擦化学抛光的Ni-W合金盘制备

doi: 10.13394/j.cnki.jgszz.2023.0042

大连理工大学, 精密与特种加工教育部重点实验室, 辽宁大连 116024

详细信息

通讯作者:
金洙吉，男，教授、博士生导师、硕士生导师。主要研究方向：精密与超精密加工技术、特种加工及其控制技术、难加工材料高效加工技术。Email： kimsg@dlut.edu.cn

中图分类号: TQ164;TG58;TQ153.2
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出版历程
- 收稿日期: 2023-02-27
- 修回日期: 2023-04-04
- 录用日期: 2023-04-13
- 网络出版日期: 2023-11-06
- 刊出日期: 2024-02-20

Preparation of Ni-W alloy disc for dynamic friction polishing of diamond

Laboratory of Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, Liaoning, China

摘要

摘要: 为探究镀液成分、工艺条件等因素对Ni-W合金镀层的影响，制备出低内应力、高硬度的Ni-W合金盘，用于金刚石的摩擦化学抛光。采用单一性实验分别探究络合剂浓度、溶液pH、糖精钠浓度对镀层内应力、钨含量、硬度以及沉积速率的影响，并探究不同添加剂对镀层表面整平的效果。最终选用水杨醛为整平剂，并采用反向脉冲电流降低了镀层表面粗糙度，制备出硬度达HV 713，镀层厚度约为0.66 mm的Ni-W合金盘。使用合金盘对金刚石进行摩擦化学抛光，并探究合适的抛光工艺参数。在合金盘转速为8000 r/min，压力为40 N时，金刚石的抛光效果较好，其材料去除率为5.56 μm/min，磨削比达0.394，金刚石表面粗糙度S_a为3.7 nm。使用传统铸铁盘对金刚石进行摩擦化学抛光，通过对比磨损参数发现，Ni-W合金盘能够达到更好的抛光效果。
- 金刚石 /
- Ni-W合金 /
- 镀层内应力 /
- 摩擦化学抛光
Abstract: To investigate the impact of bath composition and process conditions on Ni-W alloy coating, Ni-W alloy discs with low internal stress and high hardness were prepared for dynamic friction polishing of diamonds. The effects of complexing agent concentration, solution pH, and saccharin sodium concentration on the internal stress, tungsten content, hardness, and deposition rate of the coating were investigated by single experiments. Additionally, the effects of different additives on the surface leveling of the coating were also investigated. Finally, salicylaldehyde was selected as the leveling agent, and the reverse pulse current was applied to reduce the surface roughness of the coating. A Ni-W alloy disc with a hardness of HV 713 and a coating thickness of about 0.66 mm was prepared. Diamond dynamic friction polishing was carried out using these alloy discs to explore appropriate polishing process parameters. The best polishing effects were achieved at a disc speed of 8000 r/min and a pressure of 40 N, yielding a removal rate of 5.56 μm/min, a grinding ratio of 0.394, and a surface roughness (Ra) of 3.7 nm. Comparing wear parameters revealed that Ni-W alloy discs can achieve better polishing effects using traditional cast iron discs in friction chemical polishing of diamonds.
- diamond /
- Ni-W alloy /
- internal stress of coating /
- tribochemical polishing

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图 1 摩擦化学抛光金刚石原理图

Figure 1. Schematic diagram of dynamic friction polishing diamond

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图 2 镀液pH值的影响

Figure 2. Effects of bath pH values

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图 3 络合剂加入量的影响

Figure 3. Influences of complexing agent content

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图 4 不同柠檬酸三钠浓度下镀层的显微形貌

Figure 4. Micromorphologies of coatings at different concentrations of trisodium citrate

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图 5 糖精钠浓度的影响

Figure 5. Effect of saccharin sodium concentration

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图 6 抛光盘表面形貌

Figure 6. Surface morphology of polishing disc

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图 7 使用不同添加剂后抛光盘的表面形貌

Figure 7. Surface morphologies of polishing discs with different additives

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图 8 添加水杨醛的电镀盘镀层侧面形貌

Figure 8. Side morphology of coating with salicylaldehyde added

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图 9 电镀盘抛光压力的影响

Figure 9. Influences of polishing pressures on electroplating plate

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图 10 电镀盘抛光转速的影响

Figure 10. Influences of polishing speeds of electroplating plate

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图 11 金刚石抛光后的表面形貌

Figure 11. Surface morphologies of polished diamond

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图 12 铸铁盘抛光压力的影响

Figure 12. Effects of polishing pressures on cast iron disc

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图 13 铸铁盘抛光转速的影响

Figure 13. Influences of polishing speeds of cast iron disc

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图 14 金刚石抛光后的表面粗糙度

Figure 14. Surface roughness after diamond polishing

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表 1 初始镀液配方

Table 1. Initial bath formula

成分	化学名称	浓度ρ /（g·L⁻¹）
主盐A	二水合硫酸镍	40.00
主盐B	六水合钨酸钠	40.00
络合剂	柠檬酸三钠	80.00
缓冲剂	硼酸	35.00
导电盐	溴化钠	10.00
表面活性剂	十二烷基硫酸钠	0.15

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表 2 实验设备

Table 2. Experimental equipment

设备名称	用途
QUANTA 450扫描电子显微镜	观察Ni-W合金镀层的微观形貌
Oxford X-Max型EDS	测量镀层的元素组分
MVS-1000Z维氏硬度计	测量镀层的显微硬度
VHX-600E超景深显微镜	观察金刚石表面形貌
3D表面光学轮廓Zygo9000	测量金刚石表面粗糙度
DV215CD精密天平	称量镀件质量
XP6梅特勒电子天平	称量金刚石质量

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表 3 金刚石的磨削参数对比

Table 3. Comparison of grinding parameters of diamond

参数	铸铁盘	电镀盘
金刚石去除率 R_dia / (μm·min⁻¹)	0.45	5.56
抛光盘磨损率 R_d / (mm³·min⁻¹)	0.45	0.13
磨削比 R₂	0.013	0.394
表面粗糙度 S_a / nm	22.8	3.7

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