The influence of precision polishing parameters on surface roughness of resin-rich layer on antenna reflective surface
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摘要: 针对新一代全碳纤维复合材料天线对反射面表面富树脂层的高质量加工需求,开展富树脂层抛光工艺试验,研究抛光时间、磨粒粒径、磨粒质量分数、加载压力以及抛光转速对富树脂层表面粗糙度的影响规律。结果表明:在当前试验条件下,表面粗糙度随抛光时间的延长先减小后趋于稳定,随着磨粒粒径或加载压力的增大而增大,随磨粒质量分数的升高或抛光转速的增大先减小后增大。在此基础上形成优化工艺参数组合是磨粒粒径为25 nm,磨粒质量分数为20%,加载压力为14.1 kPa,抛光转速为50 r/min,抛光时间为1.0 h,抛光液流量为10 mL/min,用该参数组合加工可获得表面粗糙度Sa为4.73 nm的高质量富树脂层抛光表面。Abstract: The new generation antenna has high-quality processing requirements on the resin-rich layer of the reflecting surface. A polishing experiment on the resin-rich layer was carried out to study the parameters affecting the surface roughness of the layer, namely polishing time, abrasive particle size, abrasive particle mass fraction, loading pressure and polishing speed. The results show that under the current conditions, the surface roughness first decreases and then tends to be stable with the increase of polishing time. It increases with the increase of the abrasive particle size or the loading pressure, and first decreases and then increases with the increase of the abrasive particle mass fraction or the polishing speed. On this basis, an optimized process parameter combination is formed, which includes an abrasive size of 25 nm, an abrasive particle mass fraction of 20%, a loading pressure of 14.1 kPa, a polishing speed of 50 r/min, a polishing time of 1.0 hours, and a slurry flow rate of 10 mL/min. A high-quality resin rich layer polished surface with a surface roughness Sa of 4.73 nm can be obtained by machining with this parameter combination.
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Key words:
- epoxy resin /
- polishing /
- surface roughness /
- process parameters
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表 1 富树脂层抛光试验工艺参数
Table 1. Process parameters of resin-rich layer polishing test
试验因素 数值 抛光磨粒粒径 d / nm 25, 50, 80, 100 磨粒质量分数 ω / % 5, 10, 20, 30 抛光液流量 l / (mL·min−1) 10 加载压力 p / kPa 14.1, 17.8, 31.9, 47.1 抛光转速 n / (r·min−1) 40, 50, 60, 70 抛光时间 t / h 0.5, 1.0, 1.5, 2.0, 2.5 -
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