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直流电弧等离子体喷射化学气相沉积法制备金刚石膜过程中冷阱的设计及作用

陈良贤 邵思武 刘鹏 安康 郑宇亭 黄亚博 白明洁 张建军 刘金龙 魏俊俊 李成明

陈良贤, 邵思武, 刘鹏, 安康, 郑宇亭, 黄亚博, 白明洁, 张建军, 刘金龙, 魏俊俊, 李成明. 直流电弧等离子体喷射化学气相沉积法制备金刚石膜过程中冷阱的设计及作用[J]. 金刚石与磨料磨具工程, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113
引用本文: 陈良贤, 邵思武, 刘鹏, 安康, 郑宇亭, 黄亚博, 白明洁, 张建军, 刘金龙, 魏俊俊, 李成明. 直流电弧等离子体喷射化学气相沉积法制备金刚石膜过程中冷阱的设计及作用[J]. 金刚石与磨料磨具工程, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113
CHEN Liangxian, SHAO Siwu, LIU Peng, AN Kang, ZHENG Yuting, HUANG Yabo, BAI Mingjie, ZHANG Jianjun, LIU Jinlong, WEI Junjun, LI Chengming. Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition[J]. Diamond & Abrasives Engineering, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113
Citation: CHEN Liangxian, SHAO Siwu, LIU Peng, AN Kang, ZHENG Yuting, HUANG Yabo, BAI Mingjie, ZHANG Jianjun, LIU Jinlong, WEI Junjun, LI Chengming. Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition[J]. Diamond & Abrasives Engineering, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113

直流电弧等离子体喷射化学气相沉积法制备金刚石膜过程中冷阱的设计及作用

doi: 10.13394/j.cnki.jgszz.2021.0113
基金项目: 国家重点研发计划(2018YFB0406500;2016YFE0133200);欧洲地平线Horizon 2020计划(734578)。
详细信息
    作者简介:

    陈良贤,男,1983年生,工程师。主要研究方向:大面积高质量自支撑金刚石膜制备与加工。E-mail:chenliangxianbest@163.com

    通讯作者:

    李成明,男,1962年生,教授、博导。主要研究方向:金刚石薄膜和金刚石单晶、碳材料光电器件、高功率电子热管理、功能薄膜材料等。E-mail:chengmli@mater.ustb.edu.cn

  • 中图分类号: TQ164; TB34

Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition

  • 摘要: 首先,介绍直流电弧等离子体喷射化学气相沉积法的原理以及气体循环系统的设计和其优缺点;其次,详细介绍冷阱系统的设计及其工作原理;最后,使用拉曼光谱和傅里叶变换红外光谱与光致发光光谱对比添加冷阱系统前后的金刚石薄膜的质量。结果表明:冷阱系统可以有效过滤循环气路中的热油气,避免杂质的掺入;在添加冷阱系统后,金刚石膜内掺入的杂质减少,金刚石拉曼峰半高宽降低到6.76 cm−1,接近于Ib型单晶金刚石的,且自支撑金刚石膜的晶体质量明显提高,光学透过率提升较大,在10.6 μm波长处达到68.4%。

     

  • 图  1  DCPJCVD系统的等离子体炬示意图[15]

    Figure  1.  Schematic diagram of plasma torch of DC arc plasma jet CVD system[15]

    图  2  DCPJCVD系统示意图

    Figure  2.  Schematic diagram of DC arc plasma jet CVD system

    图  3  冷阱系统示意图

    Figure  3.  Schematic diagram of cold trap system

    图  4  接入循环气路中的冷阱冷却盘

    Figure  4.  Schematic diagram of cooling disk in circulating gas channel

    图  5  等离子体炬部件表面状态

    Figure  5.  Surface state of plasma torch components

    图  6  增加冷阱前后制备的金刚石薄膜的光谱图

    Figure  6.  Spectra of diamond films prepared before and after adding cold trap

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出版历程
  • 收稿日期:  2021-11-20
  • 修回日期:  2021-12-20
  • 录用日期:  2021-12-29
  • 刊出日期:  2022-05-27

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