CN 41-1243/TG ISSN 1006-852X
CN
Advanced Search+
Volume 42 Issue 6
Jan.  2023
Turn off MathJax
Article Contents
Article Navigation >  Diamond & Abrasives Engineering  > 2022  >  42(6): 753-759
CHEN Guomei, DU Chunkuan, NI Zifeng, BIAN Da, WANG Hao, ZHANG Ping, ZHANG Xin. Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel[J]. Diamond & Abrasives Engineering, 2022, 42(6): 753-759. doi: 10.13394/j.cnki.jgszz.2022.0047
Citation: CHEN Guomei, DU Chunkuan, NI Zifeng, BIAN Da, WANG Hao, ZHANG Ping, ZHANG Xin. Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel[J]. Diamond & Abrasives Engineering, 2022, 42(6): 753-759. doi: 10.13394/j.cnki.jgszz.2022.0047
shu

Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel

doi: 10.13394/j.cnki.jgszz.2022.0047
  • 1.

    School of Intelligent Equipment and Automotive Engineering, Wuxi Vocational Institute of Commerce, Wuxi 214153, Jiangsu, China

  • 2.

    School of Mechanical Engineering, Jiangnan University, Wuxi 214122, Jiangsu, China

More Information
  • Received Date: 2022-04-13
  • Accepted Date: 2022-05-26
  • Rev Recd Date: 2022-05-19
    Abstract
  • To improve the chemical mechanical polishing (CMP) performance of 316L stainless steel, the effect and its mechanism of complexing agent types on the CMP process of 316L stainless steel were studied. The influence of complexing agent types, including glycine, oxalic acid and citric acid, and their concentrations on polishing performance of 316L stainless steel were investigated with material removal rate (MRR) and surface roughness Ra as indexes. Electrochemical workstation, contact angle measuring instrument and X-ray photoelectron spectroscopy (XPS) were performed to analyze the affecting mechanism of complexing agents on 316L stainless steel CMP processing. The results indicated that only when the mass fraction of glycine was 0.2%, both higher MRR of 210 nm/min and lower Ra of 1.613 nm could be obtained. The inhibition effect of complexing agent with high concentration on 316L stainless steel MRR was because the complexing agent enhanced the corrosion resistance and reduced the oxidation rate of 316L stainless steel surface. The XPS results showed that part of glycine complex would be attached on the surface of 316L stainless steel to produce corrosion inhibition.

     

    • FullText(HTML)
  • loading
    • References(18)
  • [1]
    马双义. 柔性不锈钢衬底CIGS电池阻挡层及界面钝化的研究[D]. 保定: 河北大学, 2021.

    MA Shuangyi. Study on barrier layer and interface passivation of CIGS cells on flexible stainless steel substrate [D]. Baoding: Hebei University, 2021.
    [2]
    WENG J, LIN R, RONG X. Study on polishing slurry of hydrogen peroxide-oxalic acid in CMP 304 stainless steel [J]. MATEC Web of Conferences,2020,327(1):02002. doi: 10.1051/matecconf/202032702002
    [3]
    王浩, 陈国美, 倪自丰, 等. 1, 2, 4-三氮唑和苯并三氮唑对316L不锈钢化学机械抛光的影响 [J]. 金刚石与磨料磨具工程,2021,41(1):83-88. doi: 10.13394/j.cnki.jgszz.2021.1.0014

    WANG Hao, CHEN Guomei, NI Zifeng, et al. Effect of 1, 2, 4-triazole and benzotriazole on chemical-mechanical polishing of 316L stainless steel [J]. Diamond & Abrasives Engineering,2021,41(1):83-88. doi: 10.13394/j.cnki.jgszz.2021.1.0014
    [4]
    HU X, SONG Z, LIU W, et al. Chemical mechanical polishing of stainless steel foil as flexible substrate [J]. Applied Surface Science,2012,258(15):5798-5802. doi: 10.1016/j.apsusc.2012.02.100
    [5]
    NI Z, ZHANG P, CHEN G, et al. An innovative movement mode of friction and wear tester worktable and its application in CMP [J]. Ecs Journal of Solid State Science and Technology,2021,10(10):103010. doi: 10.1149/2162-8777/ac2b3a
    [6]
    LEE D, LEE H, JEONG H. Slurry components in metal chemical mechanical planarization (CMP) process: A review [J]. International Journal of Precision Engineering and Manufacturing,2016,17(12):1751-1762. doi: 10.1007/s12541-016-0201-y
    [7]
    LEE D, KIM H, PAK B, et al. Electrochemical analysis of the slurry composition for chemical mechanical polishing of flexible stainless-steel substrates [J]. Journal of Friction and Wear,2017,38(6):482-489. doi: 10.3103/S1068366617060083
    [8]
    JIANG L, HE Y, LUO J. Chemical mechanical polishing of steel substrate using colloidal silica-based slurries [J]. Applied Surface Science,2015,330:487-495. doi: 10.1016/j.apsusc.2015.01.016
    [9]
    王玉松, 江亮, 钱林茂. 过氧化氢对轴承钢化学机械抛光性能的影响 [J]. 轻工机械,2019,37(5):1-5. doi: 10.3969/j.issn.1005-2895.2019.05.001

    WANG Yusong, JIANG Liang, QIAN Linmao. Effect of hydrogen peroxide on chemical mechanical polishing performance of bearing steel [J]. Light Industry Machinery,2019,37(5):1-5. doi: 10.3969/j.issn.1005-2895.2019.05.001
    [10]
    马莹, 何静, 马荣骏. 三价铁离子在酸性水溶液中的行为 [J]. 湖南有色金属,2005(1):36-39. doi: 10.3969/j.issn.1003-5540.2005.01.013

    MA Ying, HE Jing, MA Rongjun. Fe (Ⅲ) behaviores in acidic solutions [J]. Hunan Nonferrous Metals,2005(1):36-39. doi: 10.3969/j.issn.1003-5540.2005.01.013
    [11]
    AKSU S, DOYLE F M. Electrochemistry of copper in aqueous glycine solutions [J]. Journal of the Electrochemical Society,2001,148(1):B51-B57. doi: 10.1149/1.1344532
    [12]
    俞露, 崔艳丽, 管海跃, 等. 一水合甘氨酸亚铁螯合物的合成及其表征 [J]. 浙江大学学报(理学版),2013,40(3):291-296.

    YU Lu, CUI Yanli, GUAN Haiyue, et al. Synthesis and characterization of ferrous glycinate monohydrate [J]. Journal of Zhejiang University (Science Edition),2013,40(3):291-296.
    [13]
    GORANTLA V R K, GOIA D, MATIJEVIC E, et al. Role of amine and carboxyl functional groups of complexing agents in slurries for chemical mechanical polishing of copper [J]. Journal of the Electrochemical Society,2005,152(12):912-916. doi: 10.1149/1.2083287
    [14]
    黄乃宝, 梁成浩, 郭华. 抛光液对304钢在模拟PEMFC阳极环境中电化学行为的影响 [J]. 腐蚀科学与防护技术,2009,21(2):218-220. doi: 10.3969/j.issn.1002-6495.2009.02.047

    HUANG Naibao, LIANG Chenghao, GUO Hua. Influence of polishing solution on electrochemical behavior of 304SS in a simulated PEMFC anode environment [J]. Corrosion Science and Protection Technology,2009,21(2):218-220. doi: 10.3969/j.issn.1002-6495.2009.02.047
    [15]
    GORANTLA V R K, BABEL A, PANDIJA S, et al. Oxalic acid as a complexing agent in CMP slurries for copper [J]. Electrochemical and Solid-State Letters,2005,8(5):G131-G134. doi: 10.1149/1.1883873
    [16]
    宋国强, 檀柏梅, 刘玉岭, 等. AEO表面活性剂EO加成数对铜互连阻挡层抛光液的影响 [J]. 应用化工,2021,50(9):2362-2366. doi: 10.3969/j.issn.1671-3206.2021.09.007

    SONG Guoqiang, TAN Baimei, LIU Yuling, et al. Effect of EO addition number of AEO surfactant on polishing slurry for barrier layer of copper interconnect [J]. Applied Chemical Industry,2021,50(9):2362-2366. doi: 10.3969/j.issn.1671-3206.2021.09.007
    [17]
    黄力, 刘洋, 纵宇浩, 等. 烟气中 Fe2O3对商用V-Mo/Ti 脱硝催化剂的性能影响研究 [J]. 化学试剂,2021,43(11):1486-1491.

    HUANG Li, LIU Yang, ZONG Yuhao, et al. Investigation of Fe2O3 in flue gas on the catalytic performance of commercial V-Mo/Ti De-NOx catalyst [J]. Chemical Reagents,2021,43(11):1486-1491.
    [18]
    邬倩倩, 黄满红, 宋佳玲, 等. Fe0/H2O2对正渗透处理印染废水的性能影响及机理研究 [J]. 膜科学与技术,2021,41(5):105-113.

    WU Qianqian, HUANG Manhong, SONG Jialing, et al. Effect of Fe0/H2O2 on the performance and mechanism of forward osmosis treatment of practical printing and dyeing wastewater [J]. Membrane Science and Technology,2021,41(5):105-113.
    • Relative Articles
    • Supplements(0)
    • Cited By
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索

    Figures(6)

    Get Citation
    PDF
    XML

    Article Metrics

    Article views (404) PDF downloads(40) Cited by()
    Proportional views
    Related
    Website Copyright © Zhengzhou Research Institute for Abrasives and Grinding Co., Ltd.  豫ICP备05008669号
    Address：No. 121, Wutong Street, Hitech Zone, Zhengzhou  Postal Code：450001
    Phone: 0371-67650914 67661785
    Email Alerts RSS

    Supported by: Beijing Renhe Information Technology Co., Ltd.    

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return