Tribological Performance of Alternating Multilayer Diamond Films on Si3N4 Ceramic Substrates
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摘要: 为避免氮化硅材料因摩擦磨损造成的失效,利用热丝化学气相沉积技术在氮化硅基底表面沉积单层和交替多层金刚石薄膜,采用X射线衍射仪、扫描电子显微镜、原子力显微镜和拉曼光谱仪对制备的金刚石薄膜的形核、薄膜质量、表面和截面形貌、表面粗糙度等进行表征;利用“球-盘”往复式摩擦磨损实验机,测试金刚石薄膜的摩擦系数并计算其磨损率,分析不同结构薄膜的摩擦磨损性能。结果表明:相比于单层金刚石薄膜,交替多层膜结构表现出更好的摩擦学性能,当交替次数为4,多层结构层数为8时,摩擦系数和磨损率最低,分别为0.016和1.042×10-7 mm3·N-1·m-1;但随着多层结构层数的增加,层间厚度减小,摩擦过程中薄膜发生破裂和剥落现象,薄膜与基底的结合强度降低,薄膜的质量下降,摩擦系数增大为0.042,磨损率增大为4.661×10-7 mm3·N-1·m-1,薄膜的耐磨性下降。Abstract: To avoid failures such as friction and wear of silicon nitride(Si3N4), Single-layer diamond films and Multi-layer diamond films were deposited on silicon nitride substrate by HOT FILAMENT CHEMICAL VAPOR DEPOSition. The nucleation, film quality, diamond surface and cross-sectional morphology, and surface roughness of the diamond films were characterized using X-ray Diffraction(XRD), Scanning Electron Microscopy(SEM), Atomic Force Microscopy(AFM), and Raman Spectroscopy(Raman). The friction and wear properties of different structural thin films were studied by the "ball disc" reciprocating friction and wear testing machine. The results show that multi-layer diamond films exhibit better tribological properties than single-layer diamond films. When the number of alternations is 4(the number of multilayer layers is 8), the friction coefficient and wear rate are the lowest, with values of 0.016 and 1.042×10-7 mm3·N-1·m-1; but as the number of layers in the multi-layer structure increases, the interlayer thickness decreases, and the films rupture and peel off during the friction process; the bonding strength between the film and the substrate decreases, the quality of the film decreases, the friction coefficient increases to 0.042, and the wear rate increases to 4.661×10-7 mm3·N-1·m-1, the friction and wear properties of films decreases.
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