Numerical simulation and experimental study on the uniformity of MPCVD diamond coatings
-
摘要: 本文基于多物理场耦合仿真软件COMSOL Multiphysics微波等离子体模块建立了MPCVD反应腔内氢气等离子体的仿真模型,研究基底外侧增设的环状钼支架及其不同Δh(钼支架与基底的高度差)对基底表面等离子体分布的影响。采用变异系数对等离子体分布的均匀性进行定量分析,利用SEM表征对金刚石涂层表面形貌进行分析。研究结果表明,当Δh=0 mm时,等离子体分布的均匀性最佳,涂层形貌相较于无钼支架时明显提升。当Δh<0 mm时,等离子体分布的均匀性随Δh增大而提升;当Δh>0 mm时,等离子体分布的均匀性不增反降。Abstract: Based on the microwave plasma module of COMSOL Multiphysics, a numerical model of hydrogen plasma inside a MPCVD reactor was built to investigate the effect of the addition of an annular molybdenum holder at the outer side of the substrate and different Δh (the height difference between molybdenum holder and the substrate) on the distribution of plasma at the surface of the substrate. The uniformity of the plasma distribution was quantitatively analyzed by using the coefficient of variation, and the surface morphology of the diamond coating was analyzed by using SEM. The results show that when Δh = 0 mm, the uniformity of plasma distribution is optimal, and the coating morphology is significantly improved compared with that without molybdenum holder. When Δh < 0 mm, the uniformity of plasma distribution increases with the increase of Δh; when Δh >0 mm, the uniformity decreases.
-
Key words:
- diamond coating /
- uniformity /
- microwave plasma /
- numerical simulation
点击查看大图
计量
- 文章访问数: 215
- HTML全文浏览量: 90
- 被引次数: 0